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RT-70V series 4 Point Probe Sheet Resistance/Resistivity Measurement System
RT-70V / TS-7D
(Tester + Hand-held 4-point probe measurement unit)
Size ; 20mm minimum
RT-70V/ RG-7C
(Tester with Motorized Z Axis)
Size ; Up to 300mm
Max Thickness ;  10mm
RT-70V / RG-5
(Tester + Manual Z axis)
Size ; Up to 200mm
​Max Thickness ; ~ 10mm
RT-70V / RG-7S
(Tester + Manual X-Y & Auto Z axis)
Size ; Up to 500 x 500mm
Max Thickness ; ~ 10mm
Measurement tester ; RT-70V 
  • Thickness input with easy JOG dial operation (RT-70V Tester)
  • Tester self-test function/Auto change-over measurement range function

Choose from following stage models by your purpose & applications.

Measurement stage
  • (1) RG-7C: Motorized probe up-down stroke.
  • (2) RG-5: Manual probe up-down stroke by hand lever.
  • (3) RG-7S: Motorized probe up-down stroke for larger Glass or Film samples with manual X-Y universal stage.
  • (4) TS-7D: Hand held four point probe measurement instrument.  *Stage plate is an option.
Applications
  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)
  • New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
  • Conductive thin film (Metal, ITO etc)
  • Diffused sample (or layer)
  • Silicon-related thin films (LTPS etc), IGZO
  • Silicon-related epitaxial materials, Ion-implantation sample
  • Chemical compound semiconductor (GaAs Epi, GaN Epi, InP, Ga etc)
  • Others (*Please contact us for details)

Sample sizes: Depend on measurement stage.
Up to <Circle> 300mm(12 inch) or <Square> 730x920mm size.

Measuring range: [R] 1μ~3M Ω・cm,  [RS] 5m~10M Ω/sq
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Mapping 4 Point Probe Sheet Resistance/Resistivity Measurement Systems
RT-3000/RG-2000
Semi-automatic 4 point probe sheet resistance/resistivity measurement
CRESBOX
Semi-automatic 4 point probe sheet resistance/resistivity measurement 
RG-200PV for Solar Cells
Semi-automatic 4 point probe sheet resistance/resistivity measurement
Description
  • User programable measurement pattern & programmable measuring pattern
  • Self-test function, wide measuring range
  • Thickness, edge, temperature correction for silicon wafer
  • Film thickness conversion function from sheet resistance
  • Range Selection: (S version: Standard type, H version: High range resistivity )
Applications
  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)
  • New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
  • Conductive thin film (Metal, ITO etc)
  • Diffused sample (or layer)
  • Silicon-related thin films (LTPS etc), IGZO
  • Silicon-related epitaxial materials, Ion-implantation sample
  • Others (*Please contact us for details)

Sample sizes~ 8 inch, ~156x156mm
-Option(Large size stage: Model RG-3000); ~12 inch, ~210x210mm

Measuring range
  1. 1. RT-3000/S version: 
           [R] 100μ~1M Ω・cm
           [RS] 1m~10M Ω/sq
  1. 2. RT-3000/H version:
           [RS] 10mΩ/sq?1GΩ/sq
Description
  • User programable measurement pattern & programmable measuring pattern
  • Self-test function, wide measuring range
  • Thickness, edge, temperature correction for silicon wafer
  • Film thickness conversion function from sheet resistance

​Applications
  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)
  • New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
  • Conductive thin film (Metal, ITO etc)
  • Diffused sample (or layer)
  • Silicon-related epitaxial materials, Ion-implantation sample
  • Others (*Please contact us for details)

Sample sizes:  ~ 8 inch, ~156x156mm

Measuring range: 
[R] 1m~300k Ω・cm
[RS] 5m~10M Ω/sq
​Description
  • Customized specifically for Solar wafers
  • User programable measurement pattern & programmable measuring pattern
  • Self-test function, wide measuring range
  • Thickness, & temperature correction for silicon wafer
  • Film thickness conversion function from sheet resistance
Applications
  • Mono / polycrystalline silicon cells, epitaxial wafers
  • Conductive thin film (Metal, ITO etc)
  • Diffused sample (or layer)
  • Silicon-related epitaxial materials, Ion-implantation sample
  • Other sizes and options (*Please contact us for details)

Sample sizes:  To 160x 160 mm
Thickness: 100 um to 5 mm

Measuring range: 
[R] 1m~300k Ω・cm
[RS] 5m~10M Ω/sq
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DUORES Hand held Sheet resistance measurement instrument
Includes Replaceable probe sets (Non-Contact probe & Contact probe) 

​Contact probe
(4point probe method)
​Non-destructive probe
(Eddy current method)
Description
Easy to measure sheet resistance & carry around
Replaceable hand-held probes for Non-destructive & Contact type
 Replaceable hand-held probes for 2 kinds of measurement methods:
  1. Non-destructivetype(Eddy current method)
  2. Contact type(4point probe method)
•Auto-measurement start by probe head proximity
•Long-battery run time : 24h (*Battery-operated mode)
•Measurement data display : Max.100 data points
•Measurement data save : Max.50,000 data points
•Measurement data transfer by USB-Mini
•Measurement unit : Ω/□, S/□,n/m
•Data displayed by 4 digit floating decimal point
*Mainbody+Non-destructive probe set, Mainbody+Contact probe set are also available.

Applications
Any sample within the measurement range
can be measured. (Films, Glass, Papers etc)
•Thin-film (ITO, TCO, etc)
•Low-E-Glass
•CNT(Carbon nanotubes), Graphenmaterials
•Metals (nano-wires, grids, meshes, thin films)

Sample sizes
Any size and shape can be measured.
(*Larger than measurement spot size)
<Measurement Spot size>
・Non-destructive probe(Eddy current type) : φ25mm
・Contact probe(4point probe type) : 9mm
Measuring range
・Non-destructive probe(Eddy current type) : 0.5 -200 Ω/sq
・Contact probe(4point probe type) : 0.1 -4000 Ω/sq