Non-Contact Probe Sheet Resistance/Resistivity Measurement System
EC-80
Non-contact sheet resistance/resistivity measurement instrumenton-contact sheet resistance /resistivity measurement instrument
  Description
  • Easy operation and compact design
  • Auto-measurement start by inserting a wafer under the probe
  • Easy set up to measurement condition by JOG dial
  • 5 types of model for each measuring range
Applications
  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)
  • New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
  • Conductive thin film (Metal, ITO etc)
  • Silicon-related epitaxial materials, Ion-implantation sample
  • Chemical compound semiconductor (GaAs Epi, GaN Epi, InP, Ga etc)
  • Others (*Please contact us for details)

Sample sizes 8 inch, 156x156mm



Measuring range [R] 1m ~ 200 Ω・cm
[RS] 10m ~ 3,000 Ω/sq
* The range is separated from each Low, Middle, High and S-High probe type.
EC-80P (Portable)
Hand held probe type eddy current sheet resistance/resistivity measurement instrument
  Description
  • Auto-measurement start by probe head contacting to sample
  • 3 measurement modes for wafer resistivity, bulk resistivity and sheet resistance
  • Easy set up to measurement condition by JOG dial
  • 5 types of model for each measuring range
  • Resistivity probe can be changed by sample’s resistivity range
Applications
  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)
  • New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
  • Conductive thin film (Metal, ITO etc)
  • Silicon-related epitaxial materials, Ion-implantation sample
  • Chemical compound semiconductor (GaAs Epi, GaN Epi, InP, Ga etc)
  • Others (*Please contact us for details)

Sample size: Any size and shape can be measured(*Larger than 20mmφ and measurement plane must be flat)

Measuring range: 
[R] 1m ~ 200 Ω・cm
[RS] 10m ~ 3,000 Ω/sq* The range is separated from each Low, Middle, High S-High, Solar-wafer  probe type.
​PVE-80
​Non-Contact (Pulse-Voltage excitation method) Ultra-Low Sheet resistance measurement system
Description
  • No damage measurement using non-contact Pulse-Voltage excitation method
  • Very low conductivity range to 50 μ/ Ω/sq
  • Easy operation and data processing by PC with Software
  • Calculates Sheet resistance[Ohm/Sq], Electric conductivity[S/cm], Electrical conduction[S]
  • *Pulse-Voltage excitation method : Pat. No.5386394
  •   Joint development with Chiba Univ.
​​ Applications
  • New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
  • Conductive thin film (Metal, ITO etc)
  • Chemical compound semiconductor (GaAs Epi, GaN Epi, InP, Ga etc)
  • Others (*Please contact us for details)

Sample sizes~W300 x D210mm

Measuring range: ​ 50μ ～ 1m Ω/sq
NC-10 (NC-20)
Non-contact sheet resistance/resistivity measurement instrument with PC
Description
  • Easy operation and data processing by PC
  • No damage measurement by non-contact eddy current method
  • Replaceable probes by meas. range (*Second or more probe is for the option)
  • 1 point measurement of center position
  • 5 types of model for each measuring range
  • Temperature correction for silicon wafer function
Applications
  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)
  • New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
  • Conductive thin film (Metal, ITO etc)
  • Silicon-related epitaxial materials, Ion-implantation sample
  • Chemical compound semiconductor (GaAs Epi, GaN Epi, InP, Ga etc)
  • Others (*Please contact us for details)

Sample sizes 3 ~ 8 inch, ~156x156mm (Option; 2 inch and/or 12 inch, ~210x210mm)

Measuring range: ​ R] 1m ~ 200 Ω・cm
[RS] 10m ~ 3,000 Ω/sq
​* The range is separated from each Low, Middle, High and S-High probe type.
Picture
Mapping Non-Contact Sheet Resistance/Resistivity Measurement Systems
Semi-automatic Non-contact sheet resistance/resistivity measurement
Description
  • Wide range measurement and high accuracy with out contact
  • Fully programmable measurement patterns for any shape sample
  • Hi Speed mapping up to 1 sample/sec with 217 points
  • Includes SPC software and 2-D, 3-D Graphic Display of results
  • Software controlled self calibration
  • High Speed X-Θ motorized stage supports 2 or 3 probes, software selectable
  • Conforms to ASTM F
Applications
  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC)
  • Ceramics, compound matrices, Carbon nanotube, graphene, Ag nanowire, etc.
  • Conductive thin films (Metal, ITO, etc.)
  • Silicon-related epitaxial materials, Ion-implantation
  • Chemical compound semiconductor (GaAs Epi, GaN Epi, InP, Ga,etc.)

Sample sizes~ 50 to 200 mm dia, or156x156mm
-Option(Large size stage:  ~300 mm, ~210x210mm

Probe Measurement ranges:
(1)   Low: 0.01~0.5Ω/□ (0.001~0.05Ω-cm)
(2)  Middle : 0.5~10Ω/□ (0.05~0.5Ω-cm)
(3)  High : 10~1000Ω/□ (0.5~60Ω-cm)
(4)  S-High : 1000~3000Ω/□ (60~200Ω-cm)
CRN-100
Non-contact Ultra-High range sheet resistance measurement system
Description
  • User programmable measurement pattern & programmable measuring pattern
  • Self-test function, wide measuring range
  • Thickness, edge, temperature correction for silicon wafer
  • Film thickness conversion function from sheet resistance

​Applications
  • Semiconductor materials, Solar-cell materials (Silicon, Polysilicon, SiC etc)
  • New materials, functional materials (Carbon nanotube, DLC, graphene, Ag nanowire etc)
  • Conductive thin film (Metal, ITO etc)
  • Diffused sample (or layer)
  • Silicon-related epitaxial materials, Ion-implantation sample
  • Others (*Please contact us for details)

Sample sizes:  ~ 8 inch, ~156x156mm

Measuring range: 
[RS] 10E9 to 10E15 Ohms/Sq.
Picture
DUORES Hand held Sheet resistance measurement instrument
Includes Replaceable probe sets (Non-Contact probe & Contact probe) 

​Contact probe
(4point probe method)
​Non-destructive probe
(Eddy current method)
Description
Easy to measure sheet resistance & carry around
Replaceable hand-held probes for Non-destructive & Contact type
 Replaceable hand-held probes for 2 kinds of measurement methods:
  1. Non-destructivetype(Eddy current method)
  2. Contact type(4point probe method)
•Auto-measurement start by probe head proximity
•Long-battery run time : 24h (*Battery-operated mode)
•Measurement data display : Max.100 data points
•Measurement data save : Max.50,000 data points
•Measurement data transfer by USB-Mini
•Measurement unit : Ω/□, S/□,n/m
•Data displayed by 4 digit floating decimal point
*Mainbody+Non-destructive probe set, Mainbody+Contact probe set are also available.

Applications
Any sample within the measurement range
can be measured. (Films, Glass, Papers etc)
•Thin-film (ITO, TCO, etc)
•Low-E-Glass
•CNT(Carbon nanotubes), Graphenmaterials
•Metals (nano-wires, grids, meshes, thin films)

Sample sizes
Any size and shape can be measured.
(*Larger than measurement spot size)
<Measurement Spot size>
・Non-destructive probe(Eddy current type) : φ25mm
・Contact probe(4point probe type) : 9mm
Measuring range
・Non-destructive probe(Eddy current type) : 0.5 -200 Ω/sq
・Contact probe(4point probe type) : 0.1 -4000 Ω/sq